B-MRS newsletter. Year 4, issue 8.


 

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Newsletter of the Brazilian Materials Research Society

Year 4, issue 8.

XVI B-MRS Meeting
Gramado, Brazil, 10-14 September 2017

Message from the chair

Dear participants,
We look forward to seeing you at the XVI SBPMat Meeting in the city of Gramado (RS), which will be held from September 10 to 14.
Sixteen years after the first annual meeting, our event impresses with its large number of abstracts and participants and the quality of the scientific contributions that will be presented in posters and oral sessions. This year, we will have 22 symposiums, 1 workshop and 1 tutorial. We will bring together a prolific group of authors and speakers from Brazil, Latin America and from many places in the world, everyone with the common goal of sharing ideas and new perspectives on a wide range of scientific and technological topics. We will also have 7 plenary lectures given by the most prestigious scientists on cutting edge issues in Materials Science and a lecture by the renowned Brazilian scientist João Alziro H. da Jornada at the opening of the meeting.
I am sure the event will offer a unique opportunity for collaboration and interactions. It will provide the means to having contact with leading scientists in their fields, as well as with friends and collaborators. At the closing of the event, the awards from SBPMat and ACS Publications journals will be bestowed to the best student works.
I trust the event will be stimulating and inspiring for all of you. As always, our aim is high in order to promote the development of Materials Science and Technology.

Daniel Eduardo Weibel
Chairman of the XVI B-MRS Meeting

weibel

Overview

Presentations: Approximately 2,000 works will be presented in the oral and poster sessions at the event’s 23 symposia.

Participants: To date, more than 1,300 people from 20 countries and all regions of Brazil are registered to participate in the event.

Thematic range: Characterization, manufacture and modification of various materials (polymers, metals, composites, hydrogels, nanomaterials, biomaterials). Applications energy, aeronautics, health, electronics, bioelectronics, photonics, plasmonics and photocatalysis, among other areas. Production environmental impact and safe use of some materials.

Exhibitors: 24 companies and institutions will be in the exhibition booths.

See the detailed program of oral and poster presentations, here.

See the program summary, here.

imagem encontro teste

Useful information

Registration: Registration will remain open until the last day of the event. The B-MRS annual membership can be done during the event registration. Notice: The registration cost for the event + SBPMat annual fee is less than the registration cost for the event for non-members. See here.

Avoid queues. Access the registration system with your username and password, go to “attendee” and print your barcode.

Tourism agency. Flight options, airport transfers and tours, here.

Poster printing services. See how to pick up your poster at the convention center, here.

Venue. FAURGS convention center. Rua São Pedro 663. A few blocks from restaurants, shops, tourist areas and hotels. See map, here.

Event app. In the app, you will find the Google map to access the convention center, useful phone numbers, schedule of presentations with their respective abstracts, QRCode reader for posters detailed data, and more. The app is available free of charge. Look for “XVI B-MRS Meeting” at Apple and Google virtual stores or go to the links, here.

Program book. It will be available only in PDF format. Download, here.

Party. The Conference Party will be held on Wednesday, the 13th, starting at 9 pm at the Harley Motor Show, thematic bar of Gramado. Tickets (limited) will be on sale at the bar. The party will be sponsored by journals of ACS Publications. See here.

Program highlights

Sunday 10th. Tutorial How to Produce and Publish High Impact Papers. It will be delivered by Professor Valtencir Zucolotto (IFSC-USP) and PhD Christiane Barranguet, Publishing Director for Materials Science at Elsevier. More information and registration (free of charge), here.

workshop

Sunday 10th. Memorial lecture “Joaquim da Costa Ribeiro”. This year the traditional B-MRS tribute will be bestowed to Professor João Alziro H. da Jornada (UFRGS), who will give a lecture on new perspectives in Materials Science and innovation in Brazil. See the interview with Professor Jornada, here.

jornada

Monday 11th. Plenary lecture of Hans-Joachim Freund on heterogeneous catalysis. Freund (h-index= 97) is Director of the Fritz-Haber Institute of the Max-Planck-Gesellschaft Society (prestigious institute in Berlin, Germany, dedicated to surfaces and interfaces), where he leads a research group on heterogeneous catalysis. Learn more.

freund

Monday 11th. Plenary lecture of Alexander Yarin on agro-waste nanofibers produced by solution blowing, and their applications in health and environment. Yarin is Distinguished Professor at the University of Illinois at Chicago, USA, where he coordinates a research laboratory in fluids and solids mechanics. Learn more.

yarin

Tuesday 12th. Plenary lecture of Susan Trolier-McKinstry on piezoelectric films for microelectromechanical systems (MEMS). The scientist currently chairs the Materials Research Society. Professor at Penn State (USA), she leads a group with extensive experience in piezoelectric materials and their use in MEMS. Learn more.

susan

Tuesday 12th. Plenary lecture of Kenneth E. Gonsalves on materials for fabrication of integrated circuits of less than 10 nm, using extreme ultraviolet lithography. The Distinguished Professor of IIT Mandi (India) has developed R&D projects for big companies in the field. Learn more.

gonsalves

Tuesday 12th and Wednesday 13th. Technical lectures. During two mornings and afternoons, 13 lectures will address in depth various techniques of materials characterization and modification and the latest innovations in the area. Learn more.

empresas

Wednesday 13th. Plenary lecture of Kirk Schanze on conjugated polyelectrolytes and their applications in energy and biomaterials. Editor-in-chief of ACS Applied Materials & Interfaces and Professor at the University of Texas at San Antonio (UTSA) in the USA. His research group is a pioneer in synthesis and applications of polyelectrolytes. Learn more.

schanze

Wednesday 13th. Plenary lecture of Frédéric Guittard on super-hydrophobic materials inspired by Nature. Prof. Guittard and his group at Nice Sophia Antipolis University (France) are among the most cited in the world on hydro-and oleophobic surfaces with useful applications such as antifreeze, antifouling and antibacterial materials. Learn more.

guittard

Thursday 14th. Plenary lecture of Pulickel Ajayan on challenges and opportunities on Nanotechnology for the materials of the future. Professor at Rice University (USA), h-index= 144, he is the author of prominent contributions in the world of nanomaterials, such as filled nanotubes, paper battery and ultra-dark nanotube carpet. Learn more.

ajayan

Thursday 14th. Students awards ceremony. The best oral and poster of each symposium presented by undergraduate and graduate students will be announced and awarded. The best 6 contributions of all the event will receive prizes from ACS Publications journals. The authors must be present at the ceremony to receive the awards. Learn more.

acs premios

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Interview with Kenneth E. Gonsalves (Distinguished Professor at the Indian Institute of Technology Mandi, India).


Kenneth Gonsalves
Kenneth Gonsalves

In the race to develop ever smaller and better performing chips, several technological limitations need to be overcome. Today, the bottlenecks to continue this trend lie mainly in techniques for manufacturing electronic circuits of less than 10 nanometers (nm). Among the techniques being improved to manufacture the next generation of chips, one of the most promising is extreme ultraviolet lithography (EUVL). This technology takes advantage of the very short wavelength of extreme ultraviolet radiation to pattern nanoscale circuits on the chip with the intermediation of the so-called “resists” – thin layers of radiation sensitive material that cover the chip substrate during nanofabrication.

At the XVI B-MRS Meeting, a plenary lecture will discuss an important contribution that the materials field can make to the next generation of chips: the development of suitable resists for the fabrication of electronic circuits of less than 10 nm through EUVL.

The subject will be presented by Kenneth E. Gonsalves, Distinguished Professor of the Indian Institute of Technology Mandi (IIT Mandi), a teaching and research institution created in 2009, where Gonsalves arrived in 2012 as a visiting professor.

Gonsalves obtained his BS in Chemistry from the University of Delhi (India) followed by an MS also in Chemistry from Boston College (USA) and a PhD from the University of Massachusetts at Amherst (USA) with a doctoral thesis on polymer synthesis. Then he performed a postdoctoral specialization on polymer ceramics at MIT (USA). From 2001 to 2014, Gonsalves was the Celanese Acetate Distinguished Professor of Polymer Materials at the University of North Carolina at Charlotte (USA).

Together with his research group at IIT and his collaborators from the United States, India, Brazil, Taiwan and Europe, Gonsalves carries out research and development on resists for advanced nanofabrication techniques, with support of major companies in the electronics segment, and on polymer scaffolds for tissue engineering.

Here follows a brief interview with the researcher.

B-MRS newsletter: – Tell us a little bit about your main scientific/ technological contributions up to the moment.

Kenneth Gonsalves: – My research has centered on polymers with an emphasis on synthesis of novel materials. For the last 20 years I have focused on resist technology for IC (integrated circuit) fab. This is a fascinating area as it has significant technological applications in the development of integrated circuits, solid state devices. In addition it can also be used successfully for cell and tissue engineering of scaffolds for biotechnologies.

B-MRS newsletter: – About the resists you are working on, what skills and expertise are needed to develop them, in your opinion? When this next generation of chips is expected to be available?

Kenneth Gonsalves: – Resist R&D is multifaceted and extremely complex. It requires extensive collaborations between chemists with organic, inorganic and polymer backgrounds. In addition, interaction with physicists and electrical/electronic engineers is essential. The next generation of chips at the 14 nm node are currently available. Sub 7 nm node technology is expected by 2018 onwards.

B-MRS newsletter: – Describe in the simplest and briefest possible way the process of EUVL, without forgetting to mention the role of resists.

Kenneth Gonsalves: – The EUV photons are generated by a plasma or synchrotron source operating at a wavelength of 13.5 nm. Through a series of special mirrors and a mask, the predesigned template for the IC fab is projected onto photosensitive materials such as polymers as well as inorganics. This is all conducted in vacuum, a challenge for the IC fab industry as it is a drastic change from current photolithography fab, which functions under ambient conditions. The extremely short EUV wavelength is a prerequisite for patterning features at the sub 20 nm scale. The challenges for resists that can meet the sub 7 nm node requirements are enormous. A new paradigm is paramount – hybrid resists, that are partially inorganic may provide solutions to patterning at these scales. Inorganic hardmasks are another alternative. The sensitivity of these photoresists has to be enhanced drastically in order to meet the mass volume production of chips. There are several other critical parameters that have to be met for a successful resist system. Again, this requires multidisciplinary, multi institutional, industry collaboration on a global scale.

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More information

On XVI B-MRS Meeting website, click on the photo of Kenneth Gonsalves and see his mini CV and the abstract of his plenary lecture: http://sbpmat.org.br/16encontro/home/