SYMPOSIUM M
ADVANCED MICROSCOPY TECNIQUES FOR MATERIALS CHARACTERIZATION AND MODIFICATION

Patrocinado pela SBMM como parte do MICROMAT 2006 (10^o Congresso Brasileiro de Microscopia dos Materiais) e V Reunião Anual da Sociedade Brasileira de Pesquisas em Materiais - SBPMat

The microscopy techniques are currently being developed through the continuous improvement of the resolution as well as through the diversification of functions and integration of various instruments in one platform. These advances result in increasing universalization of the microscopy equipments, which turn out to be considered as real nanolaboratories. Scanning electron microscopes associated to EDS and EBSD techniques allow the characterization of different materials leading to a variety of information both on the texture and composition of the materials. Besides the characterization of materials, these equipments actually are used also for processing and modification of materials and fabrication of new micro and nanostructures. Examples of the advances in this area are: scanning electron microscopes transformed in electron beam lithography instruments, micro-Raman spectroscopy integrated with AFM resulting in dramatic increase of the spatial resolution due to the TERS (tip-enhanced Raman scattering) effect or FIB/SEM microscopes which comprise focused electron and ion beams in one equipment. FIB/SEM microscopes allow acquisition of images with high resolution, modification of the material analyzed and fabrication of structures utilizing processes induced by the ion beam.

This Symposium intends to stimulate the discussion about the developments in the microscopy area, inviting the scientific community to participate by sending contributions related to the use of:

• Scanning probe microscopy (AFM, STM, LFM, MFM, EFM, etc) ;
• Scanning electron microscopy associated to different microanalysis techniques (EDS, EBSD, STEM, FIB, etc).

Contributions for oral and poster presentation related to microscopy techniques cited here, also including the following topics, will be accepted:

• Electron beam lithography;

• Scanning probe lithography;

• Microstructure, microtexture and mesotexture of materials;

• Micro- and nano-manipulation.

The organization encourages the submission of works on both characterization and modification of materials, as well as the participation of potential users of these techniques.

Organizers of the Symposium

Chair:
Stanislav Moshkalev
UNICAMP

Co-Chair:
Carla Verissimo
CCS-UNICAMP

Papers from this Symposium will be published in a Special Issue of Journal of Materials Science

To be considered for this special issue, the Brazilian MRS paper number should precede the title of the paper on the manuscript. This number will be removed before publication.

The submission window for full manuscripts will be October 1 until November 30, 2006.

1) Go to www.editorialmanager.com/jmsc/
2) Follow Instructions for Authors
3) Be sure to select "Brazil MRS 2006" for your submission category

Journal of Materials Science Editors Grant Norton, Mark Aindow and Barry Carter will be present at the meeting to answer any questions.

All papers will be fully reviewed in the usual way. Symposia chairs will be sent a copy of each submitted paper

Copyright 2006
V Encontro da SBPMat - Sociedade Brasileira de Pesquisas em Materiais